Intel 4 Process Node In Detail: 2x Density Scaling, 20% Improved Performance

Intel 4 Process Node In Detail: 2x Density Scaling, 20% Improved Performance

Taking place this week is the IEEE’s annual VLSI Symposium, one of the industry’s major events for disclosing and discussing new chip manufacturing techniques. One of the most anticipated presentations scheduled this year is from Intel, who is at the show to outline the physical and performance characteristics of their upcoming Intel 4 process, which …

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